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optiX fab is a Fraunhofer IOF spin-off. The company was founded in 2012 to commercialize Fraunhofer IOF’s EUV optics research and development activities. Located in Jena, Germany, we design, develop and fabricate EUV imaging, illumination and collector optics. We are currently supplying chipmakers, EUV tool and source manufacturers as well as institutes, universities, synchrotron beamlines and EUV research consortia worldwide with customized multilayer and grazing incidence optics for EUV lithography applications at 13.5 nm and the entire XUV, soft and hard X-ray spectral range. Please contact for your inquiry. |